Providing innovative solutions for novel heteroepitaxy of III-V semiconductor materials and the development of related optoelectronic devices
At EPiLab (이피랩), we employ metal organic chemical vapor deposition (MOCVD) technique to realize next generation optoelectronic devices based on III-V compound semiconductor materials
State-of-the-art MOCVD reactor
Chemical Reaction During MOCVD Process at the growth front
Sub-nm scale InGaAs/InAlAs superlattice
Key Application Area
EPiLab is currently recruiting student researchers and postdoctoral fellows to work on III-V epitaxial growth and development of related optoelectronic devices. Interested students are welcome to contact us via email (honghyuk[at]hanyang.ac.kr) or visit during office hours (Rm510 Sciences and Technology Building II, Tues 9am - 12pm).
저희 연구실(EPiLab, 이피랩)은 현재 III-V 에피 성장 및 관련 광소자개발 연구를 수행할 학생연구원 및 포스닥을 모집하고 있습니다. 관심있는 학생은 이메일 혹은 정규상담시간(화요일 오전 9시 ~ 12시, 제2과학기술관 510호)에 제 연구실로 방문바랍니다.